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I.S. EN 62047-25:2016

Current

Current

The latest, up-to-date edition.

SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 25: SILICON BASED MEMS FABRICATION TECHNOLOGY - MEASUREMENT METHOD OF PULL-PRESS AND SHEARING STRENGTH OF MICRO BONDING AREA

Available format(s)

Hardcopy , PDF

Language(s)

English

Published date

01-01-2016

For Harmonized Standards, check the EU site to confirm that the Standard is cited in the Official Journal.

Only cited Standards give presumption of conformance to New Approach Directives/Regulations.


Dates of withdrawal of national standards are available from NSAI.

National Foreword
FOREWORD
1 Scope
2 Normative references
3 Terms and definitions
4 Requirements
5 Testing method
Annex A (informative) - Dimensions for testing
        structure and tensile/compressive strength
Annex B (informative) - Pull-press testing method
        example
Annex ZA (normative) - Normative references to
         international publications with their
         corresponding European publications

Defines the in-situ testing method to measure the bonding strength of micro bonding area which is fabricated by micromachining technologies used in silicon-based micro-electromechanical system (MEMS).

DocumentType
Standard
Pages
60
PublisherName
National Standards Authority of Ireland
Status
Current

EN 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
IEC 62047-1:2016 Semiconductor devices - Micro-electromechanical devices - Part 1: Terms and definitions
ISO 10012:2003 Measurement management systems — Requirements for measurement processes and measuring equipment
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