SEMI E152 : 2014
Current
Current
The latest, up-to-date edition.
MECHANICAL SPECIFICATION OF EUV POD FOR 150 MM EUVL RETICLES
Published date
12-01-2013
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Describes EUV Pod for the 150 mm Extreme Ultraviolet Lithography (EUVL) reticle, used to ship, transport and store a 6-inch reticle. The EUV Pod consists of an outer pod and a protective inner pod. The EUV Pod is to be used when a conventional reticle carrier does not meet the requirements of EUVL.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (07/2009)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
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| SEMI E57 : 2000E2(R2010) | SPECIFICATION FOR KINEMATIC COUPLINGS USED TO ALIGN AND SUPPORT 300 MM WAFER CARRIERS |
| SEMI E100 : 2004(R2010) | SPECIFICATION FOR A RETICLE SMIF POD (RSP) USED TO TRANSPORT AND STORE 6 INCH OR 230 MM RETICLES |
| SEMI T16 : 2010(R2016) | SPECIFICATION FOR USE OF DATA MATRIX SYMBOLOGY FOR AUTOMATED IDENTIFICATION OF EXTREME ULTRAVIOLET LITHOGRAPHY MASKS |
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