SEMI F63 : 2016
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
GUIDE FOR ULTRAPURE WATER USED IN SEMICONDUCTOR PROCESSING
Superseded date
08-10-2018
Superseded by
Published date
12-01-2013
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Specifies UPW quality parameters and background information for the decision-making process related to new or retrofit facilities that manufacture semiconductors with line widths of 65 nm and smaller.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (01/2003)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Superseded
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| SupersededBy |
| SEMI F61 : 2017 | GUIDE TO DESIGN AND OPERATION OF A SEMICONDUCTOR ULTRAPURE WATER SYSTEM |
| SEMI C77 : 2012 | TEST METHOD FOR DETERMINING THE COUNTING EFFICIENCY OF LIQUID-BORNE PARTICLE COUNTERS FOR WHICH THE MINIMUM DETECTABLE PARTICLE SIZE IS BETWEEN 30 NM AND 100 NM |
| SEMI F39 : 2015 | GUIDELINE FOR CHEMICAL BLENDING SYSTEMS |
| SEMI F75 : 2017 | GUIDE FOR QUALITY MONITORING OF ULTRAPURE WATER USED IN SEMICONDUCTOR MANUFACTURING |
| SEMI F110 : 2012 | TEST METHOD FOR MONO-DISPERSED POLYSTYRENE LATEX (PSL) CHALLENGE OF LIQUID FILTERS |
| SEMI E137 : 2005(R2018)E | GUIDE FOR FINAL ASSEMBLY, PACKAGING, TRANSPORTATION, UNPACKING, AND RELOCATION OF SEMICONDUCTOR MANUFACTURING EQUIPMENT |
| SEMI F98 : 2005(R2011) | GUIDE FOR TREATMENT OF REUSE WATER IN SEMICONDUCTOR PROCESSING |
| SEMI C93 : 2017 | GUIDE FOR DETERMINING THE QUALITY OF ION EXCHANGE RESIN USED IN POLISH APPLICATIONS OF ULTRAPURE WATER SYSTEM |
| SEMI C82 : 2013 | TEST METHOD FOR PARTICLE REMOVAL PERFORMANCE OF LIQUID FILTER RATED 20 TO 50 NM WITH LIQUID-BORNE PARTICLE COUNTER |
| SEMI M51 : 2012 | TEST METHOD FOR CHARACTERIZING SILICON WAFER BY GATE OXIDE INTEGRITY |
| SEMI C79 : 2013 | GUIDE TO EVALUATE THE EFFICACY OF SUB-15 NM FILTERS USED IN ULTRAPURE WATER (UPW) DISTRIBUTION SYSTEMS |
| SEMI C93 : 2017 | GUIDE FOR DETERMINING THE QUALITY OF ION EXCHANGE RESIN USED IN POLISH APPLICATIONS OF ULTRAPURE WATER SYSTEM |
| SEMI F61 : 2017 | GUIDE TO DESIGN AND OPERATION OF A SEMICONDUCTOR ULTRAPURE WATER SYSTEM |
| SEMI C1 : 2010 | GUIDE FOR THE ANALYSIS OF LIQUID CHEMICALS |
| SEMI C10 : 2009(R2014) | GUIDE FOR DETERMINATION OF METHOD DETECTION LIMITS |
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