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SEMI MF1618 : 2010(R2015)

Current

Current

The latest, up-to-date edition.

PRACTICE FOR DETERMINATION OF UNIFORMITY OF THIN FILMS ON SILICON WAFERS

Published date

12-01-2013

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Specifies a set of site distribution patterns for measuring the uniformity of a property of a thin film on a silicon wafer, as well as simple procedures for analyzing and reporting the results of those measurements.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (10/2004)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

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