SEMI MF1618 : 2010(R2015)
Current
Current
The latest, up-to-date edition.
PRACTICE FOR DETERMINATION OF UNIFORMITY OF THIN FILMS ON SILICON WAFERS
Published date
12-01-2013
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Specifies a set of site distribution patterns for measuring the uniformity of a property of a thin film on a silicon wafer, as well as simple procedures for analyzing and reporting the results of those measurements.
DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (10/2004)
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DocumentType |
Standard
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PublisherName |
Semiconductor Equipment & Materials Institute
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Status |
Current
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