SEMI P5 : 2016
Current
Current
The latest, up-to-date edition.
SPECIFICATION FOR PELLICLES
Published date
12-01-2013
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Contains the general requirements for pellicles used on photomasks or reticles in photolithographic exposure systems.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. SEMI P5.1 and SEMI P5.2 are sold as a group with their shared general specification SEMI P5. (01/2005)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
|
| SEMI D26 : 2000 | PROVISIONAL SPECIFICATION FOR LARGE AREA MASKS FOR FLAT PANEL DISPLAYS (NORTH AMERICA) |
| SEMI E100 : 2004(R2010) | SPECIFICATION FOR A RETICLE SMIF POD (RSP) USED TO TRANSPORT AND STORE 6 INCH OR 230 MM RETICLES |
| SEMI F51 : 2017 | GUIDE FOR ELASTOMERIC SEALING TECHNOLOGY |
| SEMI P10 : 2012 | SPECIFICATION OF DATA STRUCTURES FOR PHOTOMASK ORDERS |
| SEMI E111 : OCT 2017 | SPECIFICATION FOR A 150 MM RETICLE SMIF POD (RSP150) USED TO TRANSPORT AND STORE A 6 INCH RETICLE |
| SEMI E112 : OCT 2017 | SPECIFICATION FOR A 150 MM MULTIPLE RETICLE SMIF POD (MRSP150) USED TO TRANSPORT AND STORE MULTIPLE 6 INCH RETICLES |
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