ISO 18115-1:2013
Superseded
Superseded
A superseded Standard is one, which is fully replaced by another Standard, which is a new edition of the same Standard.
View Superseded by
Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy
Available format(s)
Hardcopy , PDF
Language(s)
English
Published date
04-11-2013
Superseded date
19-06-2023
Superseded by
€63.00
Excluding VAT
ISO 18115-1:2013 defines terms for surface chemical analysis. It covers general terms and those used in spectroscopy.
| Committee |
ISO/TC 201/SC 1
|
| DevelopmentNote |
Together with ISO 18115-2, supersedes ISO 18115. (07/2010) Supersedes ISO/DIS 18115-1. (11/2013)
|
| DocumentType |
Standard
|
| Pages |
104
|
| PublisherName |
International Organization for Standardization
|
| Status |
Superseded
|
| SupersededBy | |
| Supersedes |
| Standards | Relationship |
| BS ISO 18115-1:2013 | Identical |
| DIN ISO 18115-1:2016-09 (Draft) | Identical |
| DIN ISO 18115-1:2017-07 | Identical |
| JIS K 0147-1:2017 | Identical |
| NEN ISO 18115-1 : 2010 | Identical |
| NF ISO 18115-1 : 2010 | Identical |
| BS ISO 22493:2014 | Microbeam analysis. Scanning electron microscopy. Vocabulary |
| PD CEN ISO/TS 80004-6:2015 | Nanotechnologies. Vocabulary Nano-object characterization |
| ISO 19830:2015 | Surface chemical analysis — Electron spectroscopies — Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy |
| PD ISO/TR 18196:2016 | Nanotechnologies. Measurement technique matrix for the characterization of nano-objects |
| BS EN ISO 14644-10:2013 | Cleanrooms and associated controlled environments Part 10: Classification of surface cleanliness by chemical concentration |
| PD ISO/TS 80004-11:2017 | Nanotechnologies. Vocabulary Nanolayer, nanocoating, nanofilm, and related terms |
| BS ISO 18337:2015 | Surface chemical analysis. Surface characterization. Measurement of the lateral resolution of a confocal fluorescence microscope |
| BS ISO 16531:2013 | Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS |
| BS PD ISO/TS 80004-6 : 2013 | NANOTECHNOLOGIES - VOCABULARY - PART 6: NANO-OBJECT CHARACTERIZATION |
| CEN ISO/TS 80004-6:2015 | Nanotechnologies - Vocabulary - Part 6: Nano-object characterization (ISO/TS 80004-6:2013) |
| ISO 15472:2010 | Surface chemical analysis — X-ray photoelectron spectrometers — Calibration of energy scales |
| 14/30283682 DC : 0 | BS ISO 14707 - SURFACE CHEMICAL ANALYSIS - GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRY (GD-OES) - INTRODUCTION TO USE |
| 16/30302555 DC : 0 | BS ISO 16962 - SURFACE CHEMICAL ANALYSIS - ANALYSIS OF ZINC- AND/OR ALUMINIUM-BASED METALLIC COATINGS BY GLOW-DISCHARGE OPTICAL-EMISSION SPECTROMETRY |
| BS ISO 28600:2011 | Surface chemical analysis. Data transfer format for scanning-probe microscopy |
| I.S. EN ISO 14644-10:2013 | CLEANROOMS AND ASSOCIATED CONTROLLED ENVIRONMENTS - PART 10: CLASSIFICATION OF SURFACE CLEANLINESS BY CHEMICAL CONCENTRATION (ISO 14644-10:2013) |
| BS ISO 15471:2004 | Surface chemical analysis. Auger electron spectroscopy. Description of selected instrumental performance parameters |
| ISO 12406:2010 | Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of arsenic in silicon |
| ISO 20903:2011 | Surface chemical analysis — Auger electron spectroscopy and X-ray photoelectron spectroscopy — Methods used to determine peak intensities and information required when reporting results |
| DIN ISO 15632:2015-11 | Microbeam analysis - Selected instrumental performance parameters for the specification and checking of energy-dispersive X-ray spectrometers for use in electron probe microanalysis (ISO 15632:2012) |
| BS ISO 26824:2013 | Particle characterization of particulate systems. Vocabulary |
| BS ISO 23833:2013 | Microbeam analysis. Electron probe microanalysis (EPMA). Vocabulary |
| BS ISO 16242:2011 | Surface chemical analysis. Recording and reporting data in Auger electron spectroscopy (AES) |
| BS ISO 16962:2017 | Surface chemical analysis. Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry |
| ISO 13424:2013 | Surface chemical analysis — X-ray photoelectron spectroscopy — Reporting of results of thin-film analysis |
| S.R. CEN ISO/TS 80004-6:2015 | NANOTECHNOLOGIES - VOCABULARY - PART 6: NANO-OBJECT CHARACTERIZATION (ISO/TS 80004-6:2013) |
| ISO/TS 80004-13:2017 | Nanotechnologies — Vocabulary — Part 13: Graphene and related two-dimensional (2D) materials |
| DIN EN ISO 14644-10:2013-06 | Cleanrooms and associated controlled environments - Part 10: Classification of surface cleanliness by chemical concentration (ISO 14644-10:2013) |
| ASTM E 2735 : 2014 : REDLINE | Standard Guide for Selection of Calibrations Needed for X-ray Photoelectron Spectroscopy (XPS) Experiments |
| ISO/TS 80004-11:2017 | Nanotechnologies — Vocabulary — Part 11: Nanolayer, nanocoating, nanofilm, and related terms |
| 12/30241146 DC : 0 | BS ISO 16531 - SURFACE CHEMICAL ANALYSIS - DEPTH PROFILING - METHODS FOR ION BEAM ALIGNMENT AND THE ASSOCIATED MEASUREMENT OF CURRENT OR CURRENT DENSITY FOR DEPTH PROFILING IN AES AND XPS |
| 11/30196563 DC : 0 | BS EN ISO 14644-10 - CLEANROOMS AND ASSOCIATED CONTROLLED ENVIRONMENTS - PART 10: CLASSIFICATION OF SURFACE CHEMICAL CLEANLINESS BY CHEMICAL CONCENTRATION |
| BS ISO 13424:2013 | Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of results of thin-film analysis |
| BS ISO 16243:2011 | Surface chemical analysis. Recording and reporting data in X-ray photoelectron spectroscopy (XPS) |
| BS ISO 19830:2015 | Surface chemical analysis. Electron spectroscopies. Minimum reporting requirements for peak fitting in X-ray photoelectron spectroscopy |
| BS ISO 15632:2012 | Microbeam analysis. Selected instrumental performance parameters for the specification and checking of energy-dispersive X-ray spectrometers for use in electron probe microanalysis |
| BS ISO 20579-4:2018 | Surface chemical analysis. Guidelines to sample handling, preparation and mounting Reporting information related to the history, preparation, handling and mounting of nano-objects prior to surface analysis |
| ISO 16243:2011 | Surface chemical analysis — Recording and reporting data in X-ray photoelectron spectroscopy (XPS) |
| ISO 16242:2011 | Surface chemical analysis — Recording and reporting data in Auger electron spectroscopy (AES) |
| ISO 16962:2017 | Surface chemical analysis — Analysis of zinc- and/or aluminium-based metallic coatings by glow-discharge optical-emission spectrometry |
| ISO 11505:2012 | Surface chemical analysis — General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry |
| ISO 15471:2016 | Surface chemical analysis — Auger electron spectroscopy — Description of selected instrumental performance parameters |
| ISO 14707:2015 | Surface chemical analysis — Glow discharge optical emission spectrometry (GD-OES) — Introduction to use |
| ISO 22493:2014 | Microbeam analysis — Scanning electron microscopy — Vocabulary |
| BS ISO 10810:2010 | Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis |
| ISO 20579-4:2018 | Surface chemical analysis — Guidelines to sample handling, preparation and mounting — Part 4: Reporting information related to the history, preparation, handling and mounting of nano-objects prior to surface analysis |
| ISO/TR 19693:2018 | Surface chemical analysis — Characterization of functional glass substrates for biosensing applications |
| PD ISO/TS 80004-13:2017 | Nanotechnologies. Vocabulary Graphene and related two-dimensional (2D) materials |
| 18/30368969 DC : 0 | BS ISO 16129 - SURFACE CHEMICAL ANALYSIS - X-RAY PHOTOELECTRON SPECTROSCOPY - PROCEDURES FOR ASSESSING THE DAY-TO-DAY PERFORMANCE OF AN X-RAY PHOTOELECTRON SPECTROMETER |
| 17/30356000 DC : 0 | BS ISO 13084 - SURFACE CHEMICAL ANALYSIS - SECONDARY-ION MASS SPECTROMETRY - CALIBRATION OF THE MASS SCALE FOR A TIME-OF-FLIGHT SECONDARY-ION MASS SPECTROMETER |
| BS ISO 11505:2012 | Surface chemical analysis. General procedures for quantitative compositional depth profiling by glow discharge optical emission spectrometry |
| 15/30300681 DC : 0 | BS ISO 19830 - SURFACE CHEMICAL ANALYSIS - ELECTRON SPECTROSCOPIES - MINIMUM REPORTING REQUIREMENTS FOR PEAK FITTING IN X-RAY PHOTOELECTRON SPECTROSCOPY |
| BS ISO 12406:2010 | Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon |
| ISO 18337:2015 | Surface chemical analysis — Surface characterization — Measurement of the lateral resolution of a confocal fluorescence microscope |
| ASTM E 995 : 2016 : REDLINE | Standard Guide for Background Subtraction Techniques in Auger Electron Spectroscopy and X-Ray Photoelectron Spectroscopy (Withdrawn 2025) |
| ASTM E 1829 : 2014 : REDLINE | Standard Guide for Handling Specimens Prior to Surface Analysis |
| ISO/TS 80004-6:2013 | Nanotechnologies — Vocabulary — Part 6: Nano-object characterization |
| EN ISO 14644-10:2013 | Cleanrooms and associated controlled environments - Part 10: Classification of surface cleanliness by chemical concentration (ISO 14644-10:2013) |
| BS ISO 19668:2017 | Surface chemical analysis. X-ray photoelectron spectroscopy. Estimating and reporting detection limits for elements in homogeneous materials |
| BS ISO 16129:2012 | Surface chemical analysis. X-ray photoelectron spectroscopy. Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer |
| ISO 19668:2017 | Surface chemical analysis — X-ray photoelectron spectroscopy — Estimating and reporting detection limits for elements in homogeneous materials |
| 12/30255191 DC : 0 | BS ISO 11505 - SURFACE CHEMICAL ANALYSIS - GENERAL PROCEDURES FOR QUANTITATIVE COMPOSITIONAL DEPTH PROFILING BY GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRY |
| ISO 28600:2011 | Surface chemical analysis — Data transfer format for scanning-probe microscopy |
| ISO 20411:2018 | Surface chemical analysis — Secondary ion mass spectrometry — Correction method for saturated intensity in single ion counting dynamic secondary ion mass spectrometry |
| ISO 16531:2013 | Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS |
| ISO 10810:2010 | Surface chemical analysis — X-ray photoelectron spectroscopy — Guidelines for analysis |
| BS ISO 20903:2011 | Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Methods used to determine peak intensities and information required when reporting results |
| ISO 26824:2013 | Particle characterization of particulate systems — Vocabulary |
| ISO 16129:2012 | Surface chemical analysis — X-ray photoelectron spectroscopy — Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer |
| NF ISO 10810 : 2011 | SURFACE CHEMICAL ANALYSIS - X-RAY PHOTOELECTRON SPECTROSCOPY - GUIDELINES FOR ANALYSIS |
| ISO 23833:2013 | Microbeam analysis — Electron probe microanalysis (EPMA) — Vocabulary |
| ISO/TR 18196:2016 | Nanotechnologies — Measurement technique matrix for the characterization of nano-objects |
| ASTM E 1078 : 2014 : REDLINE | Standard Guide for Specimen Preparation and Mounting in Surface Analysis |
| ISO 15632:2012 | Microbeam analysis — Selected instrumental performance parameters for the specification and checking of energy-dispersive X-ray spectrometers for use in electron probe microanalysis |
| UNE-EN ISO 14644-10:2014 | Cleanrooms and associated controlled environments - Part 10: Classification of surface cleanliness by chemical concentration (ISO 14644-10:2013) |
| ISO/IEC Guide 99:2007 | International vocabulary of metrology — Basic and general concepts and associated terms (VIM) |
| ASTM E 673 : 2003 | Standard Terminology Relating to Surface Analysis (Withdrawn 2012) |
| ISO Guide 30:2015 | Reference materials — Selected terms and definitions |
| IEC 60050-111:1996 | International Electrotechnical Vocabulary (IEV) - Part 111: Physics and chemistry |
| ISO 80000-10:2009 | Quantities and units — Part 10: Atomic and nuclear physics |
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