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SEMI M24 : 2007

Current

Current

The latest, up-to-date edition.

SPECIFICATION FOR POLISHED MONOCRYSTALLINE SILICON PREMIUM WAFERS

Published date

12-01-2013

Specifies requirements for virgin silicon premium wafers with nominal diameter from 150-300 mm used for particle counting, metal contamination monitoring, and measuring pattern resolution in the photolithography process in semiconductor manufacturing.

DevelopmentNote
Not available for sale from ILI, customer to contact SEMI. (05/2001) Also available in CD-ROM. (02/2007)
DocumentType
Standard
PublisherName
Semiconductor Equipment & Materials Institute
Status
Current

SEMI M8 : 2012 SPECIFICATION FOR POLISHED MONOCRYSTALLINE SILICON TEST WAFERS
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SEMI M18 : 2012 GUIDE FOR DEVELOPING SPECIFICATION FORMS FOR ORDER ENTRY OF SILICON WAFERS
SEMI M49 : 2016 GUIDE FOR SPECIFYING GEOMETRY MEASUREMENT SYSTEMS FOR SILICON WAFERS FOR THE 130 NM TO 16 NM TECHNOLOGY GENERATIONS

SEMI M59 : 2014 TERMINOLOGY FOR SILICON TECHNOLOGY
SEMI M45 : 2010(R2017) SPECIFICATION FOR 300 MM WAFER SHIPPING SYSTEM
SEMI M18 : 2012 GUIDE FOR DEVELOPING SPECIFICATION FORMS FOR ORDER ENTRY OF SILICON WAFERS
SEMI T3 : 2013 SPECIFICATION FOR WAFER BOX LABELS
SEMI T7 : 2016 SPECIFICATION FOR BACK SURFACE MARKING OF DOUBLE-SIDE POLISHED WAFERS WITH A TWO-DIMENSIONAL MATRIX CODE SYMBOL

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