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MIL-STD-989 Base Document:1991

Withdrawn

Withdrawn

A Withdrawn Standard is one, which is removed from sale, and its unique number can no longer be used. The Standard can be withdrawn and not replaced, or it can be withdrawn and replaced by a Standard with a different number.

CERTIFICATION REQUIREMENTS FOR JAN SEMICONDUCTOR DEVICES

Available format(s)

PDF

Withdrawn date

28-07-1995

Language(s)

English

€17.95
Excluding VAT

Establishes the minimum requirements for the certification of manufacturing facilities/lines used in fabricating, assembling and testing high reliability JAN semiconductors in accordance with MIL-S-19500.

Committee
FSC 5961
DocumentType
Standard
Pages
36
PublisherName
US Military Specs/Standards/Handbooks
Status
Withdrawn

DOD 4120.3M : 1993 DEFENSE STANDARDIZATION PROGRAM (DSP) POLICIES AND PROCEDURES OFFICE OF THE ASSISTANT SECRETARY OF DEFENSE PRODUCTION AND LOGISTICS

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MIL-HDBK-279 Base Document:1985 TOTAL DOSE HARDNESS ASSURANCE GUIDELINE FOR SEMICONDUCTOR DEVICE & MICROCIRCUIT
MIL-STD-750 Revision F:2011 TEST METHODS FOR SEMICONDUCTOR DEVICES
DOD HDBK 263 : LATEST ELECTROSTATIC DISCHARGE CONTROL HANDBOOK FOR PROTECTION OF ELECTRICAL AND ELECTRONIC PARTS, ASSEMBLIES AND EQUIPMENT (EXCLUDING ELECTRICALLY INITIATED EXPLOSIVE DEVICES)METRIC
MIL S 19500 : J SEMICONDUCTOR DEVICES, GENERAL SPECIFICATION FOR
ASTM F 657 : 1992 : R1999 Standard Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning (Withdrawn 2003)
ASTM F 43 : 1999 Standard Test Methods for Resistivity of Semiconductor Materials (Withdrawn 2003)
ASTM F 120 : 1988 Practices for Determination of the Concentration of Impurities in Single Crystal Semiconductor Materials by Infrared Absorption Spectroscopy (Withdrawn 1993)
MIL-HDBK-280 Base Document:1985 NEUTRON HARDNESS ASSURANCE GUIDELINES FOR SEMICONDUCTOR DEVICES AND MICROCIRCUITS
ASTM F 47 : 1994 Test Method for Crystalographic Perfection of Silicon by Preferential Etch Techniques (Withdrawn 1998)
ASTM F 121 : 1983 : EDT 1 Test Method for Interstitial Atomic Oxygen Content of Silicon by Infrared Absorption (Withdrawn 1989)

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