SEMI M18 : 2012
Current
Current
The latest, up-to-date edition.
GUIDE FOR DEVELOPING SPECIFICATION FORMS FOR ORDER ENTRY OF SILICON WAFERS
Published date
12-01-2013
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Describes the methodology for developing specification forms for order entry including: - how to identify form sections, form columns, and form headings; - instructions for line format and how to number items; - how to add new items appropriate to a given wafer product to the form, and - how to reference new items from another section of the form.
| DevelopmentNote |
Not available for sale from ILI, customer to contact SEMI. (05/2001)
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| DocumentType |
Standard
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| PublisherName |
Semiconductor Equipment & Materials Institute
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| Status |
Current
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| SEMI M24 : 2007 | SPECIFICATION FOR POLISHED MONOCRYSTALLINE SILICON PREMIUM WAFERS |
| SEMI M1 : 2017 | SPECIFICATION FOR POLISHED SINGLE CRYSTAL SILICON WAFERS |
| SEMI T6 : 1997(R2004) | PROCEDURE AND FORMAT FOR REPORTING OF TEST RESULTS BY ELECTRONIC DATA INTERCHANGE (EDI) |
| SEMI M47 : 2007 | SPECIFICATION FOR SILICON-ON-INSULATOR (SOI) WAFERS FOR CMOS LSI APPLICATIONS |
| ASTM F 154 : 2002 | Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003) |
| SEMI M62 : 2017 | SPECIFICATIONS FOR SILICON EPITAXIAL WAFERS |
| SEMI M61 : 2007(R 2019) | SPECIFICATION FOR SILICON EPITAXIAL WAFERS WITH BURIED LAYERS |
| ASTM F 1241 : 1995 : R2000 | Standard Terminology of Silicon Technology (Withdrawn 2003) |
| SEMI M2 : 2003 | SPECIFICATION FOR SILICON EPITAXIAL WAFERS FOR DISCRETE DEVICE APPLICATIONS |
| SEMI M32 : 2007 | GUIDE TO STATISTICAL SPECIFICATIONS |
| SEMI M11 : 2004 | SPECIFICATIONS FOR SILICON EPITAXIAL WAFERS FOR INTEGRATED CIRCUIT (IC) APPLICATIONS |
| SEMI M71 : 2012 | SPECIFICATION FOR SILICON-ON-INSULATOR (SOI) WAFERS FOR CMOS LSI |
| SEMI M59 : 2014 | TERMINOLOGY FOR SILICON TECHNOLOGY |
| SEMI M41 : 2015 | SPECIFICATION OF SILICON-ON-INSULATOR (SOI) FOR POWER DEVICE/ICS |
| SEMI M24 : 2007 | SPECIFICATION FOR POLISHED MONOCRYSTALLINE SILICON PREMIUM WAFERS |
| SEMI M57 : 2016 | SPECIFICATION FOR SILICON ANNEALED WAFERS |
| SEMI M8 : 2012 | SPECIFICATION FOR POLISHED MONOCRYSTALLINE SILICON TEST WAFERS |
| SEMI M61 : 2007(R 2019) | SPECIFICATION FOR SILICON EPITAXIAL WAFERS WITH BURIED LAYERS |
| SEMI M62 : 2017 | SPECIFICATIONS FOR SILICON EPITAXIAL WAFERS |
| SEMI M38 : 2012(R2018) | SPECIFICATION FOR POLISHED RECLAIMED SILICON WAFERS |
| SEMI M16 : 2010(R2015) | SPECIFICATION FOR POLYCRYSTALLINE SILICON |
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